Virtual fabrication is used to evaluate the performance of interconnects (line and via resistance, capacitance, etc.) across pitches compatible with either EUV single exposure or SADP for three ...
—The development of a process flow capable of demonstrating functionality of a monolithic complementary FET (CFET) transistor architecture is complex due to the need to vertically separate nMOS and ...
Learning the basics can ease loop tuning frustration and ensure stability. During plant operations, it seems that tuning control loops is an ongoing task, which can be a continual frustration to ...
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